In the semiconductor and advanced manufacturing industries, process stability and water quality are directly linked to production yield. Even trace levels of organic contaminants can impact process performance, requiring extremely stringent water quality standards.
Process wastewater from these industries contains a complex mixture of chemicals, including refractory organics and trace contaminants that are difficult to remove through conventional treatment methods. As a result, achieving water quality suitable for reuse remains a significant technical challenge.
In particular, low-molecular-weight organic compounds are not fully removed by reverse osmosis (RO) systems and may remain in the treated water. This presents a critical barrier to meeting total organic carbon (TOC) requirements for reuse applications.
To address these limitations, ENhitech is developing ultraviolet (UV)-based advanced oxidation process (UV AOP) technologies. By generating highly reactive hydroxyl radicals (•OH), UV AOP enables the effective breakdown of organic compounds that are resistant to conventional treatment.
Through this approach, ENhitech aims to enhance wastewater reuse rates, reduce industrial water consumption, and support more stable and efficient semiconductor manufacturing processes.